Magnetron sputtering
It is a device for applying a conductive film treatment to samples for electron microscopy.
The "Magnetron Sputtering Device" utilizes the principle of using a powerful magnet behind the target to promote ionization at the cathode surface layer, and by applying an electric field, it causes ions to collide with the target, releasing metal molecules. This device, manufactured by Vacuum Device Co., Ltd., is characterized by extremely low damage to samples. Additionally, we offer a variety of sputtering target types, sample sizes, and prices to meet our customers' needs. Please feel free to contact us with your requests. 【Product Lineup】 ■MSP-mini ■MSP-1S ■MSP-20-UM ■MSP-20-MT ■MSP-20-TK, etc. *For more details, please download the PDF or feel free to contact us.
- Company：ユニオン
- Price：Other
